Cover is for reference only

18th Annual Symposium on Photomask Technology and Management：[proceedings] : 16-18 September, 1998, Redwood City, California

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology and Management (18th 1998 Redwood City, California; Society of Photo-Optical Instrumentation Engineers; BACUS Technical group
Group Author: Abboud Frank E; Grenon Brian J
Published: SPIE,
Publisher Address: Bellingham, Washington
Publication Dates: c1998.
Literature type: Book
Language: English
Series: Proceedings of SPIE ; v. 3546
Subjects:
Microlithography > Congresses
Integrated circuits > Masks > Congresses
Carrier Form: xiii, 672 p.: ill. ; 28 cm.
ISBN: 0819430072
Index Number: TN405
CLC: TN405.7-532
TN305.7-532
Call Number: TN305.7-532/S989/1998/
Contents: Includes bibliographic references and author index.

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