Screen LibraryChemical-mechanical polishing 2001：advantages and future challenges : symposium held April 18-20, 2001, San Francisco, California, U.S.A.
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| Corporate Authors: | |
|---|---|
| Group Author: | ; ; |
| Published: |
Materials Research Society,
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| Publisher Address: | Warrendale, Pa. |
| Publication Dates: | c2001. |
| Literature type: | Book |
| Language: | English |
| Series: |
Materials Research Society symposium proceedings ; v. 671 |
| Subjects: | |
| Carrier Form: | 1 v. (various pagings): ill. ; 24 cm. |
| ISBN: | 1558996079 |
| Index Number: | TG175 |
| CLC: |
TG175-532 TG58-532 TG17-532 |
| Call Number: | TG17-532/C517/2001 |
| Contents: |
"This volume comprises most of the papers that were presented at Symposium M, 'Chemical-Mechanical Polishing 2001--Advances and Future Challenges,' held April 18-20 at the 2001 MRS Spring Meeting in San Francisco, California ..."--Pref. Includes bibliographic references and indexes. |