Handbook of VLSI microlithography : principles, technology, and applications /
This handbook gives readers a look at the technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and X-ray lithography. The book's main theme is the specia...
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Corporate Authors: | |
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Group Author: | |
Published: |
Noyes Publications ; William Andrew Pub.,
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Publisher Address: | Park Ridge, N.J. : Norwich, N.Y. : |
Publication Dates: | 2001. |
Literature type: | eBook |
Language: | English |
Edition: | Second edition. |
Series: |
Materials science and process technology series. Electronic materials and process technology
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Subjects: | |
Online Access: |
http://www.sciencedirect.com/science/book/9780815514442 |
Summary: |
This handbook gives readers a look at the technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and X-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge, and patt |
Carrier Form: | 1 online resource (xxi, 1001 pages) : illustrations. |
Bibliography: | Includes bibliographical references and index. |
ISBN: |
1591242754 9781591242758 9780815517801 0815517807 |
Index Number: | TK7874 |
CLC: | TN47-62 |
Contents: | Issues and Trends Affecting Lithography Tool Selection Strategy -- Resist Technology: Design, Processing and Applications -- Lithography Process Monitoring and Defect Detection -- Techniques and Tools for Photo Metrology -- Techniques and Tools for Optical Lithography -- Microlithography Tool Automation -- Electron Beam ULSI Applications -- Rational Vibration and Structural Dynamics for Lithographic Tool Installations -- Applications of Ion Microbeam Lithography and Direct Processing -- X-Ray Lithography. |