Optical microlithography:technology for the mid-1980s, March 31-April 1, 1982, Santa Clara, California
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Corporate Authors: | |
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Group Author: | |
Published: |
SPIE--the International Society for Optical Engineering,
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Publisher Address: | Bellingham, Wash. |
Publication Dates: | c1982. |
Literature type: | Book |
Language: | English |
Series: |
Proceedings of SPIE--the International Society for Optical Engineering ; v. 334 |
Subjects: | |
Carrier Form: | viii, 265 p.: ill. ; 28 cm. |
ISBN: | 0892523697 (pbk.) |
Index Number: | TS828 |
CLC: | TS828-532 |
Call Number: | TS828-53/O62/ |
Contents: |
"In cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society." Includes bibliographical references and indexes. |