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Optical microlithography XX：27 February - 2 March 2007, San Jose, California, USA

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Bibliographic Details
Corporate Authors: SEMATECH, Inc; Society of Photo-Optical Instrumentation Engineers
Group Author: Flagello Donis G
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c2007.
Literature type: Book
Language: English
Series: Proceedings of SPIE ; v. 6520
Subjects:
Microlithography
X-ray lithography
Manufacturing processes
Integrated circuits > Masks
Carrier Form: 3 v.: ill. (some col.) ; 28 cm.
ISBN: 9780819466396
0819466395
Index Number: TN405
CLC: TN405.7-532
TS828-532
Call Number: TS828-532/O62/2007
Contents: Includes bibliographical references and author index.

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