Screen LibraryAn introduction to physics and technology of thin films /
Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized....
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| Published: |
World Scientific Pub. Co.,
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| Publisher Address: | Singapore : |
| Publication Dates: | 1994. |
| Literature type: | eBook |
| Language: | English |
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| Online Access: |
http://www.worldscientific.com/worldscibooks/10.1142/2227#t=toc |
| Summary: |
Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics - ferromagnetic films, diffusion in thin films and mechanical properties of thin films - are discussed. Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well. |
| Carrier Form: | 1 online resource (xi,147pages) : illustrations |
| Bibliography: | Includes bibliographical references (pages 142-143) and index. |
| ISBN: | 9789812812988 |
| Index Number: | QC176 |
| CLC: | O484 |
| Contents: | ch. 1. Thin film deposition methods. 1.1. Chemical methods. 1.2. Physical methods -- ch. 2. Theories of nucleation and film growth. 2.1. Adsorption. 2.2. Film growth. 2.3. Epitaxial growth -- ch. 3. Control and measurement of film thickness. 3.1. Rate and thickness monitors. 3.2. Measurement of film thickness -- ch. 4. Electrical conduction in thin films. 4.1. Electron transport in metallic films. 4.2. Electron transport through insulating film -- ch. 5. Dielectric properties of thin insulator films. 5.1. Dielectric constant. 5.2. Dielectric loss. 5.3. Breakdown voltage. 5.4. Thin film capacitors -- ch. 6. Superconducting films. 6.1. General features. 6.2. Thin film effects. 6.3. Applications, thin film cryogenic devices -- ch. 7. Semiconducting films. 7.1. Physical fundamentals. 7.2. Devices for integrated circuits. 7.3. The thin film transistor. 7.4. Photovoltaic cells -- ch. 8. Thin ferromagnetic films. 8.1. General. 8.2. Fundamental. 8.3. Magnetization reversal in uniaxial thin films. 8.4. Applications -- ch. 9. Diffusion in thin films. 9.1. General. 9.2. Fundamental. 9.3. Diffusion in structural inhomogeneous systems. 9.4. Application to thin films. 9.5. Selected experimental results -- ch. 10. Mechanical properties of thin films. 10.1. General. 10.2. Micromorphology of evaporated and sputtered deposits. 10.3. Determination of mechanical properties in thin films. |