Screen LibraryThin film growth : physics, materials science and applications /
Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an importa...
Saved in:
| Group Author: | |
|---|---|
| Published: |
Woodhead Publishing Limited,
|
| Publisher Address: | Cambridge : |
| Publication Dates: | 2011. |
| Literature type: | Book |
| Language: | English |
| Series: |
Woodhead publishing in materials
|
| Subjects: | |
| Summary: |
Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films. Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. |
| Carrier Form: | xvi, 416 pages : illustrations ; 24 cm. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: |
9780081017227 0081017227 |
| Index Number: | QC176 |
| CLC: |
O484.1 TB43 |
| Call Number: | O484.1/T443 |
| Contents: | Part 1 Theory of thin film growth: Measuring nucleation and growth processes in thin films -- Quantum electronic stability of atomically uniform films -- Phase-field modelling of thin film growth -- Analysing surface roughness evolution in thin films -- Modelling thin film deposition processes based on real-time observation. Part 2 Techniques of thin film growth: Silicon nanostructured films grown on templated surfaces by the oblique angle deposition technique -- Phase transitions in colloidal crystal thin films -- Thin film growth for thermally unstable noble-metal nitrides by reactive magn |