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Author: Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of A

Author Results for BACUS Technical group

Society of Photo-Optical Instrumentation Engineers
BACUS Technical group
BACUS (Technical group)
Photomask Japan
Grenon,Brian J
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SPIE (Society)
Behringer,Uwe F. W
Symposium on Photomask Technology,Monterey, Calif
European Mask and Lithography Conference,Dresden, Germany
Maurer,Wilhelm

1
Photomask and X-ray mask technology VI 13-14 April, 1999, Yokohama, Japan

Cover is for reference only
Corporate Authors: BACUS (Technical group); Photomask Japan.
Published: SPIE,
Publication Dates: c1999.
Call Number: TN305.7-532/D575/1999/
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