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Materials and processes for next generation lithography /

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Group Author: Robinson, Alex; Lawson, Richard
Published: Elsevier,
Publication Dates: [2016]
Call Number: TN405/M425
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8
Materials and Processes for Next Generation Lithography /

Cover is for reference only
Corporate Authors: Elsevier Science & Technology
Group Author: Robinson, Alex; Lawson, Richard
Published: Elsevier,
Publication Dates: 2016.
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10
Photopolymers : photoresist materials, processes, and applications /

Cover is for reference only
Main Authors: Nakamura, Kenichiro Chemical engineer
Published: CRC Press,
Publication Dates: [2015]
Call Number: TN204/N163
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11
Advances in patterning materials and processes XXXI : 24-27 February 2014, San Jose, California, United States /

Cover is for reference only
Corporate Authors: SPIE Society
Group Author: Wallow, Thomas Ingolf; Hohle, Christoph K
Published: SPIE,
Publication Dates: [2014]
Call Number: TS82-532/A244/2014
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