Photoelasticity : proceedings of the international symposium held at Illinois Institute of Technology /

Corporate Authors: International Symposium on Photoelasticity Chicago, Ill.); Elsevier Science & Technology.; Illinois Institute of Technology.; United States. Army Research Office.
Group Author: Frocht, Max Mark, 1894-1974
Published: Symposium Publications Division, Pergamon Press,
Publication Dates: 1963.