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Introduction to microlithography：theory, materials, and processing

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Bibliographic Details
Corporate Authors: American Chemical Society. Meeting 1983 Seattle, Wash.) (Seattle, Wash.)); American Chemical Society. Division of Organic Coatings and Plastics Chemistry.
Group Author: Willson C. G.; (C. Grant) 1939-; Bowden M. J., 1943-; Thompson L. F., 1944-
Published: The Society,
Publisher Address: Washington, D.C.
Publication Dates: 1983.
Literature type: Book
Language: English
Series: ACS symposium series ; 219
Subjects:
Photoresists > Congresses.
Plasma etching > Congresses.
Semiconductors > Congresses. > Congresses.
Microlithography > Congresses.
Carrier Form: ix, 363 p.: ill. ; 24 cm.
ISBN: 0841207755
Index Number: TS828
CLC: TS828-532
Call Number: TS828-53/I61/1983/
Contents: Includes bibliographical references and index.
An introduction to lithography / L.F. Thompson -- The lithographic process--the physics / L.F. Thompson and M.J. Bowden -- Organic resist materials--theory and chemistry / C. Grant Willson -- Resist processing / L.F. Thompson and M.J. Bowden -- Plasma etching / J.A. Mucha and D.W. Hess -- Multi-layer resist systems / B.J. Lin.

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