Cover is for reference only

Materials for microlithography：radiation-sensitive polymers

Saved in:
Bibliographic Details
Corporate Authors: American Chemical Society. Meeting 1984 St. Louis, Mo.) (St. Louis, Mo.)); American Chemical Society. Division of Polymeric Materials: Science and Engineering.; American Chemical Society. Division of Polymer Chemistry
Group Author: (C. Grant) 1939-; Fréchet J. M. J.; Thompson L. F., 1944-; Willson C. G.
Published: The Society,
Publisher Address: Washington, D.C.
Publication Dates: 1984.
Literature type: Book
Language: English
Series: ACS symposium series ; 266
Subjects:
Microlithography > Congresses. > Congresses.
Microelectronics > Congresses. > Congresses.
Polymers > Congresses.
Photoresists > Congresses.
Carrier Form: viii, 494 p.: ill. ; 24 cm.
ISBN: 0841208719
Index Number: TN4
CLC: TN4-532
Call Number: TN4-53/M425/
Contents: Includes bibliographies and indexes.

Related Book Recommendations