Advances in mirror technology for X-ray, EUV lithography, laser and other applications:7-8 August 2003, San Diego, California, USA
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Corporate Authors: | |
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Group Author: | ; ; |
Published: |
SPIE,
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Publisher Address: | Bellingham, Wash., USA |
Publication Dates: | c2004. |
Literature type: | Book |
Language: | English |
Series: |
SPIE proceedings series ; v. 5193 |
Subjects: | |
Carrier Form: | ix, 222 p.: ill. (some col.) ; 28 cm. |
ISBN: | 0819450669 |
Index Number: | TH74 |
CLC: | TH74-532 |
Call Number: | TH74-532/A244/2003 |
Contents: | Includes bibliographical references and index. |