Cover is for reference only

Optical microlithography X, 12-14 March, 1997, Santa Clara, California

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Bibliographic Details
Corporate Authors: Semiconductor Equipment and Materials International; SEMATECH Organization; Society of Photo-Optical Instrumentation Engineers
Group Author: Fuller Gene E
Published: SPIE,
Publisher Address: Bellingham, Washington
Publication Dates: c1997.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 3051
Subjects:
Integrated circuits > Very large scale integration > Congresses
Microlithography > Congresses
Carrier Form: xi, 982 p.: ill. ; 28 cm.
ISBN: 081942465X
Index Number: TS828
CLC: TS828-532
Call Number: TS828-532/O62/1997/
Contents: Includes bibliographic references and author index.

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