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Photomask technology 2008：7-10 October 2008, Monterey, California, USA

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Bibliographic Details
Corporate Authors: BACUS Technical group; SPIE Society
Group Author: Kawahira Hiroichi; Zurbrick Larry S
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c2008.
Literature type: Book
Language: English
Series: Proceedings of SPIE ; v. 7122
Subjects:
Integrated circuits > Masks
Microlithography
Carrier Form: 2 v.: ill. ; 28 cm.
ISBN: 9780819473554
0819473553
Index Number: TN405
CLC: TN405.7-532
Call Number: TN405.7-532/S989/2008
Contents: Some earlier conferences have the title: Symposium on Photomask Technology, or the title: Annual BACUS Symposium on Photomask Technology, or the title: BACUS Symposium on Photomask Technology.
Includes bibliographical references and author index.

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