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Materials, technology and reliability for advanced interconnects and low-k dielectrics--2004：symposium held April 13-15, 2004, San Francisco, California, U.S.A

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Bibliographic Details
Corporate Authors: Symposim on Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics (2004 San Francisco, Calif.) (San Francisco, Calif.)); Materials Research Society. Meeting (2004 San Francisco, Calif.) (San Francisco, Calif.))
Group Author: (Richard John) 1948-; Carter R. J.
Published: Materials Research Society,
Publisher Address: Warrendale, Pa.
Publication Dates: c2004.
Literature type: Book
Language: English
Series: Materials Research Society symposium proceedings, ; v. 812
Subjects:
Semiconductors > Junctions.
Dielectric films.
Integrated circuits > Materials.
Integrated circuits > Reliability.
Semiconductors > Materials.
Carrier Form: xiii, 402 p.: ill. ; 24 cm.
ISBN: 1558997628
Index Number: TM21
CLC: TM21-532
TN4-532
TN304-532
Call Number: TN304-532/M425/2004
Contents: "This proceedings volume contains 60 papers presented at Symposium F, 'Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics, ' which was held April 13-15 at the 2004 MRS Spring Meeting in San Francisco, California."--P. xiii.
Includes bibliographical references and indexes.

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