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半导体中离子注入

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Bibliographic Details
Main Authors: 卡特 G. ((英)卡特(Carter,G.原译加特),格兰特(Grant,W.A.)著); Carter G.; 格兰特 W.A.; Grant W.A.
Group Author: 张光华 (译); 赵越 (译)
Published: 国防工业出版社
Publisher Address: 北京
Publication Dates: 1982
Literature type: Book
Language: Chinese
Subjects:
半导体工艺—离子注入
离子注入—半导体工艺
Carrier Form: 245页: ; 21cm
Index Number: TN305
CLC: TN305.3
Call Number: TN305.3/2225
Contents: 书名原文:Ion implantation of semiconductors

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