Screen Library纳米集成电路制造工艺 = Nanoscale integrated circuits -- the manufacturing process
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| Main Authors: | |
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| Published: |
清华大学出版社
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| Publisher Address: | 北京 |
| Publication Dates: | 2017 |
| Literature type: | Book |
| Language: | Chinese |
| Edition: | 2版 |
| Subjects: | |
| Carrier Form: | 14,471页: 图 ; 26cm |
| ISBN: | 978-7-302-45233-1 |
| Index Number: | TN405 |
| CLC: | TN405 |
| Call Number: | TN405/1230-1 |
| Contents: | 本书共分19章，涵盖先进集成电路工艺的发展史，集成电路制造流程、介电薄膜、金属化、光刻、刻蚀、表面清洁与湿法刻蚀、掺杂、化学机械平坦化，器件参数与工艺相关性，DFM(Design for Manufacturing)，集成电路检测与分析、集成电路的可靠性，生产控制，良率提升，芯片测试与芯片封装等项目和课题。 |