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19th Annual Symposium on Photomask Technology：15-17 September 1999, Monterey, California

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology (19th 1999 Monterey, Calif; Society of Photo-Optical Instrumentation Engineers; BACUS Technical group
Group Author: Grenon Brian J; Abboud Frank E
Published: SPIE,
Publisher Address: Bellingham, Wash., USA
Publication Dates: c1999.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 3873
Subjects:
Microlithography
Integrated circuits > Masks
Carrier Form: 2 v. (xv, 1022 p.): ill. (some col.) ; 28 cm.
ISBN: 081943468X
Index Number: TN305
CLC: TN305.7-532
Call Number: TN305.7-532/S989/1999/
Contents: At the head of title: Proceedings of SPIE.
Eighteenth conference called: Symposium on Photomask Technology and Management.
Includes bibliographical references and index.

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