Cover is for reference only

17th Annual Symposium on Photomask Technology and Management：[proceedings] : 17-19 September, 1997, Redwood City, California

Saved in:
Bibliographic Details
Corporate Authors: Symposium on Photomask Technology and Management (17th 1997 Redwood City, California; Society of Photo-Optical Instrumentation Engineers; BACUS Technical group
Group Author: Grenon Brian J; Reynolds James A 1930-
Published: SPIE,
Publisher Address: Bellingham, Washington
Publication Dates: c1998.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 3236
Subjects:
Microlithography > Congresses
Integrated circuits > Masks > Congresses
Carrier Form: ix, 554 p.: ill. ; 28 cm.
ISBN: 0819426695
Index Number: TN305
CLC: TN305.7-532
TN405.7-532
Call Number: TN305.7-532/S989/1997/
Contents: Spine title: 17th Annual BACUS Symposium on Photomask Technology and Management.
Includes bibliographical references and index.

Related Book Recommendations