19th Annual Symposium on Photomask Technology:15-17 September 1999, Monterey, California
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Corporate Authors: | ; ; |
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Group Author: | ; |
Published: |
SPIE,
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Publisher Address: | Bellingham, Wash., USA |
Publication Dates: | c1999. |
Literature type: | Book |
Language: | English |
Series: |
SPIE proceedings series ; v. 3873 |
Subjects: | |
Carrier Form: | 2 v. (xv, 1022 p.): ill. (some col.) ; 28 cm. |
ISBN: | 081943468X |
Index Number: | TN305 |
CLC: | TN305.7-532 |
Call Number: | TN305.7-532/S989/1999/ |
Contents: |
At the head of title: Proceedings of SPIE. Eighteenth conference called: Symposium on Photomask Technology and Management. Includes bibliographical references and index. |