15th Annual Symposium on Photomask Technology and Management:20-22 September, 1995, Santa Clara, California

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology and Management (15th 1995 Santa Clara, Calif; SPIE--the International Society for Optical Engineering; BACUS Technical group
Group Author: Sheldon Gilbert V; Wiley Jmaes N
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c1995.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 2621
Subjects:
Carrier Form: ix, 636 p.: ill. ; 28 cm.
ISBN: 0819419850
Index Number: TN305
CLC: TN305.7-532
Call Number: TN305.7-532/S989/1995/
Contents: Includes bibliographic references and author index.