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24th Annual BACUS Symposium on Photomask Technology：14-17 September, 2004, Monterey, California, USA

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology (24th 2004 Monterey, Calif; BACUS Technical group; Society of Photo-Optical Instrumentation Engineers
Group Author: Staud Wolfgang; Weed J., Tracy
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c2004.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 5567
Subjects:
Integrated circuits > Masks
Microlithography
Carrier Form: 2 v. (xix, 1450 p.): ill. (some col.) ; 28 cm.
ISBN: 081945513X
Index Number: TN405
CLC: TN405.7-532
Call Number: TN405.7-532/S989/2004
Contents: Some earlier conferences have title: Symposium on Photomask Technology and Management.
Includes bibliographical references and author index.

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