Screen LibraryHandbook of cleaning in semiconductor manufacturing fundamentals and applications /
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| Literature type: | Electronic eBook |
| Language: | English |
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| Online Access: |
http://onlinelibrary.wiley.com/book/10.1002/9781118071748 |
| Carrier Form: | xxii, 592 p. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: |
9781118071748 (electronic bk.) 1118071743 (electronic bk.) |
| Index Number: | QC611 |
| CLC: | TN305-62 |
| Contents: | Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman -- The Chemistry of Wet Cleaning / D Martin Knotter -- The Chemistry of Wet Etching / D Martin Knotter -- Surface Phenomena: Rinsing and Drying / Karen A Reinhardt, Richard F Reidy, John A Marsella -- Fundamental Design of Chemical Formulations / Robert J Rovito, Michael B Korzenski, Ping Jiang, Karen A Reinhardt -- Filtering, Recirculating, Reuse, and Recycling of Chemicals / Barry Gotlinsky, Kevin T Pate, Donald C Grant -- Applications. Cleaning Challenges of High-k/M |