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Plasma processing XIII：proceedings of the International Symposium

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Bibliographic Details
Corporate Authors: Electrochemical Society. Meeting 2000 Toronto, Canada); Electrochemical Society. Dielectric Science and Technology Division; International Symposium on Plasma Processing 2000 Toronto, Canada); Electrochemical Society. Electronics Division
Group Author: Mathad G. S
Published: Electrochemical Society.
Publisher Address: Pennington, NJ
Publication Dates: c2000.
Literature type: Book
Language: English
Series: Proceedings ; v. 2000-6
Subjects:
Semiconductors > Etching > Congresses
Plasma etching
Carrier Form: ix, 394 p.: ill. ; 23 cm.
ISBN: 1566772710
Index Number: O539
CLC: O539-532
TN405-532
Call Number: O539-532/S989/2000
Contents: "Dielectric Science and Technology and Electronics Divisions."
"This proceedings volume contains the papers presented at the thirteenth symposium on Plasma Processing ... held as part of the 197th meeting of the Electrochemical Society, Inc. in Toronto, Canada, May 14-19, 2000."--Preface.
Includes bibliographical references and indexes.

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