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14th Annual Symposium on Photomask Technology and Management：proceedings : 14-16 September 1994, Santa Clara, California

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology and Management. Annual (14th 1994 Santa Clara, Calif; BACUS Technical group
Group Author: Shelden Gilbert V; Brodsky William L
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c1994.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 2322
Subjects:
Microlithography > Congresses
Integrated circuits > Masks > Congresses
Carrier Form: vii, 454 p.: ill. ; 28 cm.
ISBN: 0819416533
Index Number: TN305
CLC: TN305.7-532
Call Number: TN305.7-532/S989/1994/
Contents: Includes bibliographical references and index.

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