Cover is for reference only

Rapid isothermal processing：12-13 October 1989, Santa Clara, California

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Bibliographic Details
Corporate Authors: North Carolina State University. Center for Advanced Electronic Materials Processing; University of Wisconsin--Madison. Engineering Research Center for Plasma-Aided Manufacturing; SEMATECH Organization; Society of Photo-Optical Instrumentation Engineers
Group Author: Singh Rajendra 1946-
Published: SPIE,
Publisher Address: Bellingham, Wash., USA
Publication Dates: c1990.
Literature type: Book
Language: English
Series: Proceedings / SPIE--the International Society for Optical Engineering ; v. 1189
Subjects:
Semiconductor doping > Congresses
Vapor plating > Congresses
Semiconductors > Heat treatment > Congresses
Carrier Form: vi, 204 p.: ill. ; 28 cm.
ISBN: 0819402257
Index Number: TN305
CLC: TN305-532
Call Number: TN305-53/R218/1989/
Contents: Includes bibliographical references and index.

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